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CVD Equipment Corporation
Index- P/E- EPS (ttm)-0.91 Insider Own0.10% Shs Outstand6.66M Perf Week-18.79%
Market Cap25.27M Forward P/E- EPS next Y- Insider Trans-24.72% Shs Float5.37M Perf Month-1.43%
Income-6.10M PEG- EPS next Q- Inst Own15.80% Short Float0.52% Perf Quarter-38.52%
Sales16.90M P/S1.50 EPS this Y5.10% Inst Trans97.09% Short Ratio0.51 Perf Half Y-14.61%
Book/sh3.62 P/B1.15 EPS next Y- ROA-13.20% Target Price- Perf Year45.61%
Cash/sh1.26 P/C3.28 EPS next 5Y- ROE-21.00% 52W Range2.64 - 7.83 Perf YTD14.33%
Dividend- P/FCF- EPS past 5Y-30.60% ROI-16.60% 52W High-47.00% Beta1.61
Dividend %- Quick Ratio2.90 Sales past 5Y-15.40% Gross Margin17.00% 52W Low57.20% ATR0.30
Employees130 Current Ratio3.20 Sales Q/Q-41.80% Oper. Margin-46.40% RSI (14)41.44 Volatility8.14% 6.21%
OptionableNo Debt/Eq0.57 EPS Q/Q-100.70% Profit Margin-35.90% Rel Volume1.14 Prev Close4.32
ShortableYes LT Debt/Eq0.54 EarningsMay 13 AMC Payout- Avg Volume55.38K Price4.15
Recom- SMA20-6.39% SMA50-6.39% SMA200-2.99% Volume62,958 Change-3.94%
Sep-11-13Initiated Northland Capital Outperform $16
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CVD Equipment Corporation designs, develops, manufactures, and sells process equipment and solutions that are used to develop and manufacture materials and coatings for research and industrial applications in the United States and internationally. It operates through three segments: CVD, SDC, and CVD Materials. The company offers chemical vapor deposition systems for use in the research, development, and manufacture of aerospace, medical components, semiconductors, LEDs, carbon nanotubes, nanowires, solar cells, and other industrial applications; and rapid thermal processing systems for use in implant activation, oxidation, silicide formation, and other processes. It also provides annealing, diffusion, and low pressure chemical vapor deposition furnaces for use in diffusion, oxidation, implant anneal, solder reflow, solar cell manufacturing, and other processes; and gas and liquid control systems, such as gas cylinder storage cabinets, custom gas and chemical delivery systems, gas and liquid valve manifold boxes, and gas isolation boxes for semiconductor fabrication processes, solar cells, LEDs, carbon nanotubes, nanowires, and industrial applications. In addition, the company offers standard and custom fabricated quartz-ware used in its equipment and other customer tools, as well as repair and replacement services for existing quartz-ware. Further, it provides MesoPlasma direct write printing, a materials deposition process that provides instrumentation, fine feature patterns, and coatings onto conformal components; and Tantaline corrosion resistant coating for valves, fittings, fasteners, vessels, bellows, and custom designed items, as well as offers carbon composites and electronic materials. The company sells its products primarily to aerospace/defense, medical, electronic component manufacturers, universities, and government and industrial laboratories. CVD Equipment Corporation was incorporated in 1982 and is headquartered in Central Islip, New York.
Insider Trading Relationship Date Transaction Cost #Shares Value ($) #Shares Total SEC Form 4
LAKIOS EMMANUEL NVice PresidentNov 19Sale4.602,0009,2004,035Nov 19 05:19 PM
LAKIOS EMMANUEL NVice PresidentAug 18Sale3.235,00016,1505,435Aug 19 04:00 PM